Brand:Lam Research
Model:810-069751-114
Module Type:High-Precision Etching Module
Operating Voltage:220 V
Frequency Range:50 Hz
Process Precision:±0.05%
Chamber Volume:2 liters
Temperature Range:-20°C to 120°C
Pressure Range:10 mTorr to 10 Torr
Gas Flow Rate:0.1 to 1000 sccm
Certifications:CE, UL, RoHS
The Lam Research 810-069751-114 is a cutting-edge solution for high-precision semiconductor etching. This module is meticulously engineered to deliver exceptional accuracy and repeatability in semiconductor fabrication processes. The robust design ensures reliable performance under demanding conditions, making it ideal for advanced manufacturing environments.
The module’s precise control over temperature and pressure, combined with its wide gas flow rate range, allows for versatile etching capabilities. Its compact yet efficient chamber volume maximizes throughput while maintaining high-quality results.
With certifications including CE, UL, and RoHS, this module meets stringent international safety and environmental standards. Its user-friendly interface simplifies operation and maintenance, ensuring minimal downtime and maximum productivity.
Designed with the highest quality materials, the Lam Research 810-069751-114 is built to withstand the rigorous demands of semiconductor fabrication, offering long-lasting performance and reliability.
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